PVD Tool
Tool Configuration
- Each PVD is equipped with six chamber positions and is highly integrated with EFEM.
- Highly customizable chamber configurations based on customer requirements.
- Optional wafer handling configurations.
- including ICP and degas options.
- Optional long throw configuration available.
- Reactive sputtering can be equipped with an in-situ pasting module.
- Equipped with SECS / GEM for automation.