• It is well-known that QDs can be damaged by oxygen, moisture, and heat. Therefore, applying Al₂O₃ (passivation) to the surface of QDs can prolong their lifespan and enhance stability.
• Atomic Layer Deposition (ALD) is the ideal technique for coating and passivating QD thin films because it offers excellent control over film growth at the sub-nanometer grade and produces highly conformal coatings under gentle processing conditions.

• Optional ozone generator for more oxidation source choices.
• Special flow field design to provide better powder coating.
• Special heater design to provide uniform chamber temperature.
• Supports three sets of precursor/co-precursor pipelines.
• Applicable for powder coating to effectively protect the powder.